Invention Grant
- Patent Title: Semiconductor apparatus having stacked devices and method of manufacture thereof
-
Application No.: US16660448Application Date: 2019-10-22
-
Publication No.: US11495540B2Publication Date: 2022-11-08
- Inventor: Lars Liebmann , Jeffrey Smith , Anton deVilliers
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/092 ; H01L21/768 ; H01L25/07

Abstract:
Aspects of the disclosure provide a semiconductor apparatus including a plurality of structures. A first one of the structures comprises a first stack of transistors that includes a first transistor formed on a substrate and a second transistor stacked on the first transistor along a Z direction substantially perpendicular to a substrate plane of the semiconductor apparatus. The first one of the structures further includes local interconnect structures. The first transistor is sandwiched between two of the local interconnect structures. The first one of the structures further includes vertical conductive structures substantially parallel to the Z direction. The vertical conductive structures are configured to provide at least power supplies for the first one of the structures by electrically coupling with the local interconnect structures. A height of one of the vertical conductive structures along the Z direction is at least a height of the first one of the structures.
Public/Granted literature
- US20210118799A1 SEMICONDUCTOR APPARATUS HAVING STACKED DEVICES AND METHOD OF MANUFACTURE THEREOF Public/Granted day:2021-04-22
Information query
IPC分类: