Invention Grant
- Patent Title: Sample support, sample ionization method, and mass spectrometry method
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Application No.: US17262596Application Date: 2019-06-19
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Publication No.: US11521843B2Publication Date: 2022-12-06
- Inventor: Miu Takimoto , Takayuki Ohmura , Masahiro Kotani
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2018-142328 20180730
- International Application: PCT/JP2019/024361 WO 20190619
- International Announcement: WO2020/026629 WO 20200206
- Main IPC: H01J49/04
- IPC: H01J49/04 ; H01J49/00
Abstract:
A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.
Public/Granted literature
- US20210257201A1 SAMPLE SUPPORT, SAMPLE IONIZATION METHOD, AND MASS SPECTROMETRY METHOD Public/Granted day:2021-08-19
Information query
