Invention Grant
- Patent Title: Laser apparatus, EUV light generating system, and electronic device manufacturing method
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Application No.: US16865803Application Date: 2020-05-04
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Publication No.: US11532920B2Publication Date: 2022-12-20
- Inventor: Seiji Nogiwa
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: H01S3/13
- IPC: H01S3/13 ; H01S3/131 ; H01S3/0941 ; H05G2/00 ; H01S3/06 ; H01S3/16 ; H01S3/08

Abstract:
A laser apparatus according to the present disclosure includes an excitation light source configured to output excitation light, a laser crystal disposed on an optical path of the excitation light, a first monitor device disposed on an optical path of transmitted excitation light after having transmitted through the laser crystal to monitor the transmitted excitation light, a temperature adjustment device configured to adjust a temperature of the excitation light source to a constant temperature based on a temperature command value, and a controller configured to change the temperature command value based on a result of monitoring by the first monitor device.
Public/Granted literature
- US20200266603A1 LASER APPARATUS, EUV LIGHT GENERATING SYSTEM, AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2020-08-20
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