Laser apparatus, EUV light generating system, and electronic device manufacturing method

    公开(公告)号:US11532920B2

    公开(公告)日:2022-12-20

    申请号:US16865803

    申请日:2020-05-04

    Inventor: Seiji Nogiwa

    Abstract: A laser apparatus according to the present disclosure includes an excitation light source configured to output excitation light, a laser crystal disposed on an optical path of the excitation light, a first monitor device disposed on an optical path of transmitted excitation light after having transmitted through the laser crystal to monitor the transmitted excitation light, a temperature adjustment device configured to adjust a temperature of the excitation light source to a constant temperature based on a temperature command value, and a controller configured to change the temperature command value based on a result of monitoring by the first monitor device.

    Laser apparatus and measurement unit

    公开(公告)号:US10483713B2

    公开(公告)日:2019-11-19

    申请号:US15698412

    申请日:2017-09-07

    Abstract: A laser apparatus may include: a quantum cascade laser outputting, based on a supplied current, laser light at an oscillation start timing when a first delay time elapses from a current rising timing of the supplied current: an amplifier disposed in a laser light optical path, and selectively amplifying light of a predetermined wavelength to output the amplified laser light to a chamber including a plasma generation region into which a target is fed; and a laser controller controlling a third delay time, from an output timing of a laser output instruction to the current rising timing, to cause a laser light wavelength to be equal to the predetermined wavelength at an aimed timing when a second delay time elapses from the oscillation start timing, based on oscillation parameters including the first delay time, a supplied current waveform, and a device temperature of the quantum cascade laser.

    Laser apparatus and extreme ultraviolet light generating apparatus

    公开(公告)号:US10165665B2

    公开(公告)日:2018-12-25

    申请号:US15454027

    申请日:2017-03-09

    Inventor: Seiji Nogiwa

    Abstract: A laser beam having desired properties is output at desired timings. A laser apparatus is a laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance, and may be equipped with: a semiconductor laser that outputs a laser beam when a trigger signal is input thereto; an optical switch that switches between a state in which the laser beam passes therethrough and a state in which the laser beam does not pass therethrough, provided along the optical path of the laser beam; and a control unit configured to output the trigger signal to the semiconductor laser at a frequency which is an integer multiple of the repetition frequency, and to control the optical switch such that the laser beam passes therethrough at the repetition frequency.

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