Invention Grant
- Patent Title: Method of forming graphene
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Application No.: US16675350Application Date: 2019-11-06
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Publication No.: US11572278B2Publication Date: 2023-02-07
- Inventor: Hyeonjin Shin , Keunwook Shin , Changhyun Kim , Seunggeol Nam , Kyung-Eun Byun , Hyunjae Song , Eunkyu Lee , Changseok Lee , Alum Jung , Yeonchoo Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0135330 20181106
- Main IPC: B32B9/00
- IPC: B32B9/00 ; C01B32/186 ; B82Y30/00

Abstract:
A method of growing graphene includes forming a carbon monolayer on a substrate by injecting a first reaction gas into a reaction chamber, wherein the first reaction gas includes a first source including a component that is a carbon source and belongs to an electron withdrawing group, and injecting a second reaction gas including a second source into the reaction chamber, wherein the second source includes a functional group that forms a volatile structure by reacting with a component that belongs to an electron withdrawing group. Graphene may be directly grown on a surface of the substrate by repeatedly injecting the first reaction gas and the second reaction gas.
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