- Patent Title: Scanning electron microscope and a method for overlay monitoring
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Application No.: US17369746Application Date: 2021-07-07
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Publication No.: US11646173B2Publication Date: 2023-05-09
- Inventor: Itay Asulin , Emil Weisz , Eitam Yitzchak Vinegrad , Menachem Lapid , Boris Rozensvaig
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/28

Abstract:
A scanning electron microscope and a method for evaluating a sample, the method may include (a) illuminating the sample with a primary electron beam, (b) directing secondary electrons emitted from the sample and propagated above a first scintillator, towards an upper portion of the first scintillator, wherein the first scintillator and a second scintillator are positioned between the sample and a column electrode of the column; wherein the first scintillator is positioned above the second scintillator; (c) detecting the secondary electrons by the first scintillator; (d) directing backscattered electrons emitted from the sample towards a lower portion of the second scintillator; and (e) detecting the backscattered electrons by the second scintillator.
Public/Granted literature
- US20210335569A1 SCANNING ELECTRON MICROSCOPE AND A METHOD FOR OVERLAY MONITORING Public/Granted day:2021-10-28
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