Invention Grant
- Patent Title: Connections from buried interconnects to device terminals in multiple stacked devices structures
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Application No.: US17326449Application Date: 2021-05-21
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Publication No.: US11646318B2Publication Date: 2023-05-09
- Inventor: Daniel Chanemougame , Lars Liebmann , Jeffrey Smith
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L23/528 ; H01L21/84 ; H01L23/535 ; H01L21/74

Abstract:
In vertically stacked device structures, a buried interconnect and bottom contacts can be formed, thereby allowing connections to be made to device terminals from both below and above the stacked device structures. Techniques herein include a structure that enables electrical access to each independent device terminal of multiple devices, stacked on top of each other, without interfering with other devices and the local connections that are needed.
Public/Granted literature
- US20220102380A1 CONNECTIONS FROM BURIED INTERCONNECTS TO DEVICE TERMINALS IN MULTIPLE STACKED DEVICES STRUCTURES Public/Granted day:2022-03-31
Information query
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