Invention Grant
- Patent Title: Method and device for etching patterns inside objects
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Application No.: US16787432Application Date: 2020-02-11
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Publication No.: US11682550B2Publication Date: 2023-06-20
- Inventor: Michael Vidra , Robert Vaccaro , Edward Palanko , Mark Megela
- Applicant: Tech Met, Inc.
- Applicant Address: US PA Glassport
- Assignee: Tech Met, Inc.
- Current Assignee: Tech Met, Inc.
- Current Assignee Address: US PA Glassport
- Agency: Dentons Cohen & Grigsby P.C.
- Main IPC: H01S3/00
- IPC: H01S3/00 ; H01L21/02 ; G02B27/09 ; H01S5/00 ; G02B27/30 ; B23K26/352 ; B23K26/362 ; B23K26/402 ; B23H3/00 ; B26D7/26 ; B26D3/08 ; C23F1/00 ; C23F1/02 ; C23F1/04 ; B23K26/0622 ; B23K26/10 ; B23K26/40 ; B23K26/08 ; B23K26/046 ; B23K26/00 ; B23K26/361 ; G02B26/10 ; H01S5/062 ; B23K103/16 ; B23K101/12 ; B23K103/00 ; B23K103/08 ; B23K101/06 ; B23K103/02

Abstract:
Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.
Public/Granted literature
- US20200176243A1 METHOD AND DEVICE FOR ETCHING PATTERNS INSIDE OBJECTS Public/Granted day:2020-06-04
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