公开(公告)号：US20240254390A1

公开(公告)日：2024-08-01

申请号：US18628784

申请日：2024-04-07

Applicant: Tech Met, Inc.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

CPC classification number: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38 ,  A61L2430/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US20220017822A1

公开(公告)日：2022-01-20

申请号：US17488093

申请日：2021-09-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US11682550B2

公开(公告)日：2023-06-20

申请号：US16787432

申请日：2020-02-11

Applicant: Tech Met, Inc.

Inventor： Michael Vidra ,  Robert Vaccaro ,  Edward Palanko ,  Mark Megela

IPC: H01S3/00 ,  H01L21/02 ,  G02B27/09 ,  H01S5/00 ,  G02B27/30 ,  B23K26/352 ,  B23K26/362 ,  B23K26/402 ,  B23H3/00 ,  B26D7/26 ,  B26D3/08 ,  C23F1/00 ,  C23F1/02 ,  C23F1/04 ,  B23K26/0622 ,  B23K26/10 ,  B23K26/40 ,  B23K26/08 ,  B23K26/046 ,  B23K26/00 ,  B23K26/361 ,  G02B26/10 ,  H01S5/062 ,  B23K103/16 ,  B23K101/12 ,  B23K103/00 ,  B23K103/08 ,  B23K101/06 ,  B23K103/02

CPC classification number: H01L21/02019 ,  B23H3/00 ,  B23K26/0006 ,  B23K26/046 ,  B23K26/0622 ,  B23K26/0823 ,  B23K26/0869 ,  B23K26/103 ,  B23K26/352 ,  B23K26/355 ,  B23K26/361 ,  B23K26/362 ,  B23K26/40 ,  B23K26/402 ,  B26D3/08 ,  B26D7/2614 ,  C23F1/00 ,  C23F1/02 ,  C23F1/04 ,  G02B26/10 ,  G02B27/0955 ,  G02B27/0977 ,  G02B27/30 ,  H01L21/02675 ,  H01S3/0071 ,  H01S5/0071 ,  H01S5/0085 ,  H01S5/06243 ,  B23K2101/06 ,  B23K2101/12 ,  B23K2103/02 ,  B23K2103/08 ,  B23K2103/16 ,  B23K2103/42 ,  B23K2103/50 ,  B23K2103/52 ,  B23K2103/54

Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.

公开(公告)号：US20200176243A1

公开(公告)日：2020-06-04

申请号：US16787432

申请日：2020-02-11

Applicant: Tech Met, Inc.

Inventor： Michael Vidra ,  Robert Vaccaro ,  Edward Palanko ,  Mark Megela

IPC: H01L21/02 ,  B23K26/361 ,  B23K26/00 ,  B23K26/046 ,  B23K26/08 ,  B23K26/40 ,  B23K26/10 ,  B23K26/0622 ,  B23K26/352 ,  C23F1/04 ,  C23F1/02 ,  C23F1/00 ,  B26D3/08 ,  B26D7/26 ,  B23H3/00 ,  B23K26/402 ,  B23K26/362 ,  G02B27/09 ,  G02B27/30 ,  H01S5/00

Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.

公开(公告)号：US11952523B2

公开(公告)日：2024-04-09

申请号：US17488093

申请日：2021-09-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

CPC classification number: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38 ,  A61L2430/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US11851772B2

公开(公告)日：2023-12-26

申请号：US15930484

申请日：2020-05-13

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C23F1/40 ,  A61L31/02 ,  A61L27/06 ,  A61L27/36 ,  C09K13/02

CPC classification number: C23F1/40 ,  A61L27/06 ,  A61L27/365 ,  A61L31/022 ,  C09K13/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.