Invention Grant
- Patent Title: Sample support, sample ionization method, and mass spectrometry method
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Application No.: US17719121Application Date: 2022-04-12
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Publication No.: US11694883B2Publication Date: 2023-07-04
- Inventor: Miu Takimoto , Takayuki Ohmura , Masahiro Kotani
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Riddle & Reath LLP
- Priority: JP 18147887 2018.08.06
- Main IPC: H01J49/00
- IPC: H01J49/00 ; H01J49/04

Abstract:
A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a frame body provided in a peripheral portion of the substrate to surround an ionization region in which a sample is ionized when viewed in a thickness direction of the substrate, in which a marker for recognizing a position in the ionization region is provided in the frame body.
Public/Granted literature
- US20220238317A1 SAMPLE SUPPORT, SAMPLE IONIZATION METHOD, AND MASS SPECTROMETRY METHOD Public/Granted day:2022-07-28
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