Invention Grant
- Patent Title: X-ray detection apparatus and method
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Application No.: US17534865Application Date: 2021-11-24
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Publication No.: US11699567B2Publication Date: 2023-07-11
- Inventor: Takanori Murano
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP 20196725 2020.11.27 JP 21168081 2021.10.13
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/244

Abstract:
A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.
Public/Granted literature
- US20220172923A1 X-Ray Detection Apparatus and Method Public/Granted day:2022-06-02
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