- Patent Title: Providing metric data for patterns usable in a modeling environment
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Application No.: US17374806Application Date: 2021-07-13
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Publication No.: US11782682B2Publication Date: 2023-10-10
- Inventor: Huanhuan Xu , Partha Biswas , Madhav Rajan , Sherman Braganza , Chirag Gupta , Neha Pal , Radhey Shyam Meena
- Applicant: The MathWorks, Inc.
- Applicant Address: US MA Natick
- Assignee: The Math Works, Inc.
- Current Assignee: The Math Works, Inc.
- Current Assignee Address: US MA Natick
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: G06F9/44
- IPC: G06F9/44 ; G06F8/36 ; G06F8/77 ; G06F8/10

Abstract:
Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.
Public/Granted literature
- US20230021771A1 PROVIDING METRIC DATA FOR PATTERNS USABLE IN A MODELING ENVIRONMENT Public/Granted day:2023-01-26
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