Invention Grant
- Patent Title: Integral sweep in ion beam system
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Application No.: US17740733Application Date: 2022-05-10
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Publication No.: US11784025B1Publication Date: 2023-10-10
- Inventor: Sarpangala Hariharakeshava Hegde , Armin Baur , Wei-Hua Hsiao
- Applicant: Plasma-Therm NES LLC
- Applicant Address: US FL St. Petersburg
- Assignee: PLASMA-THERM NES LLC
- Current Assignee: PLASMA-THERM NES LLC
- Current Assignee Address: US FL St. Petersburg
- Agency: Burr & Forman LLP
- Agent Harvey S. Kauget
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/305

Abstract:
The present disclosure provides a method of achieving an integral number of sweeps within an ion beam. A substrate having a fiducial is placed on a wafer stage within the ion beam system. An energetic particle beam is generated within the ion beam system. The substrate is exposed to the energetic particle beam while the wafer stage with the substrate is rotated clockwise so that the fiducial of the substrate travels a sweep distance in a clockwise direction at a first speed and the fiducial of the substrate travels the same sweep distance in a counterclockwise direction at a second speed. The exposure of the substrate to the energetic particle beam is discontinued when the number of complete/full sweeps in the clockwise direction equals the number of complete/full sweeps in the counterclockwise direction.
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