Invention Grant
- Patent Title: Multiple charged-particle beam apparatus and methods
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Application No.: US16885872Application Date: 2020-05-28
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Publication No.: US11854765B2Publication Date: 2023-12-26
- Inventor: Weiming Ren , Xuedong Liu , Xuerang Hu , Zhong-wei Chen , Martinus Gerardus Johannes Maria Maassen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER, LLP
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/145 ; H01J37/28

Abstract:
Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.
Public/Granted literature
- US20200381211A1 MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS Public/Granted day:2020-12-03
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