Invention Grant
- Patent Title: Laser chamber and electronic device manufacturing method
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Application No.: US17457514Application Date: 2021-12-03
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Publication No.: US11947263B2Publication Date: 2024-04-02
- Inventor: Makoto Tanaka , Yosuke Fujimaki , Takashi Ito , Yousuke Kawagoe
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F04D23/00 ; F04D29/66 ; G03F7/00 ; H01S3/036 ; H01S3/225

Abstract:
A laser chamber of a discharge-excitation-type gas laser apparatus may include a container which contains laser gas therein; a pair of discharge electrodes arranged in the container; a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; and a stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades.
Public/Granted literature
- US20220091515A1 LASER CHAMBER AND ELECTRONIC DEVICE MANUFACTURING METHOD Public/Granted day:2022-03-24
Information query
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