Invention Grant
- Patent Title: Charged particle beam device
-
Application No.: US17435118Application Date: 2019-03-08
-
Publication No.: US11967482B2Publication Date: 2024-04-23
- Inventor: Wen Li , Hajime Kawano , Momoyo Enyama , Makoto Sakakibara
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee: HITACHI HIGH-TECH CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- International Application: PCT/JP2019/009527 2019.03.08
- International Announcement: WO2020/183551A 2020.09.17
- Date entered country: 2021-08-31
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/147 ; H01J37/20
Abstract:
Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
Public/Granted literature
- US20220102105A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2022-03-31
Information query
