• Patent Title: Gain-guided semiconductor laser and method of manufacturing the same
  • Application No.: US17277023
    Application Date: 2019-09-12
  • Publication No.: US11984704B2
    Publication Date: 2024-05-14
  • Inventor: Jens Ebbecke
  • Applicant: OSRAM OLED GmbH
  • Applicant Address: DE Regensburg
  • Assignee: OSRAM OLED GMBH
  • Current Assignee: OSRAM OLED GMBH
  • Current Assignee Address: DE Regensburg
  • Agency: MH2 TECHNOLOGY LAW GROUP LLP
  • Priority: DE 2018123019.2 2018.09.19
  • International Application: PCT/EP2019/074362 2019.09.12
  • International Announcement: WO2020/058082A 2020.03.26
  • Date entered country: 2021-03-17
  • Main IPC: H01S5/22
  • IPC: H01S5/22 H01S5/042 H01S5/065
Gain-guided semiconductor laser and method of manufacturing the same
Abstract:
In an embodiment, the gain-guided semiconductor laser includes a semiconductor layer sequence and electrical contact pads. The semiconductor layer sequence includes an active zone for radiation generation, a waveguide layer, and a cladding layer. The semiconductor layer sequence further includes a current diaphragm layer which is electrically conductive along a resonator axis (R) in a central region and electrically insulating in adjoining edge regions. Transverse to the resonator axis (R), the central region includes a width of at least 10 μm and the edge regions includes at least a minimum width. The minimum width is 3 μm or more. Seen in plan view, the semiconductor layer sequence as well as at least one of the contact pads on the semiconductor layer sequence are continuous components extending in the central region as well as on both sides at least up to the minimum width in the direction transverse to the resonator axis (R) adjoining the central region and beyond the central region.
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