Gain-guided semiconductor laser and method of manufacturing the same

    公开(公告)号:US11984704B2

    公开(公告)日:2024-05-14

    申请号:US17277023

    申请日:2019-09-12

    Inventor: Jens Ebbecke

    CPC classification number: H01S5/221 H01S5/0421 H01S5/0653 H01S5/2215

    Abstract: In an embodiment, the gain-guided semiconductor laser includes a semiconductor layer sequence and electrical contact pads. The semiconductor layer sequence includes an active zone for radiation generation, a waveguide layer, and a cladding layer. The semiconductor layer sequence further includes a current diaphragm layer which is electrically conductive along a resonator axis (R) in a central region and electrically insulating in adjoining edge regions. Transverse to the resonator axis (R), the central region includes a width of at least 10 μm and the edge regions includes at least a minimum width. The minimum width is 3 μm or more. Seen in plan view, the semiconductor layer sequence as well as at least one of the contact pads on the semiconductor layer sequence are continuous components extending in the central region as well as on both sides at least up to the minimum width in the direction transverse to the resonator axis (R) adjoining the central region and beyond the central region.

    GAIN-GUIDED SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220029388A1

    公开(公告)日:2022-01-27

    申请号:US17277023

    申请日:2019-09-12

    Inventor: Jens Ebbecke

    Abstract: In an embodiment, the gain-guided semiconductor laser includes a semiconductor layer sequence and electrical contact pads. The semiconductor layer sequence includes an active zone for radiation generation, a waveguide layer, and a cladding layer. The semiconductor layer sequence further includes a current diaphragm layer which is electrically conductive along a resonator axis (R) in a central region and electrically insulating in adjoining edge regions. Transverse to the resonator axis (R), the central region includes a width of at least 10 μm and the edge regions includes at least a minimum width. The minimum width is 3 μm or more. Seen in plan view, the semiconductor layer sequence as well as at least one of the contact pads on the semiconductor layer sequence are continuous components extending in the central region as well as on both sides at least up to the minimum width in the direction transverse to the resonator axis adjoining the central region and beyond the central region.

    Optoelectronic semiconductor chip

    公开(公告)号:US10651342B2

    公开(公告)日:2020-05-12

    申请号:US16315463

    申请日:2017-07-11

    Abstract: An optoelectronic semiconductor chip is disclosed. In an embodiment an optoelectronic semiconductor chip includes a semiconductor body comprising a first semiconductor structure, a second semiconductor structure and an active region between the first and the second semiconductor structure and a plurality of recesses, each penetrating at least one of the semiconductor structures and the active region, wherein a cover surface of the active region is a continuous surface, and wherein at least in some of the recesses, surfaces of the recesses are completely covered with an electrically insulating material.

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