Invention Grant
- Patent Title: Adjustable support for arc chamber of ion source
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Application No.: US17376208Application Date: 2021-07-15
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Publication No.: US12002647B2Publication Date: 2024-06-04
- Inventor: Po-Tang Tseng , Ching-Heng Yen , Tai-Kun Kao , Sheng-Tai Peng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Lippes Mathias LLP
- Main IPC: H01J27/08
- IPC: H01J27/08 ; H01J27/02 ; H01J37/317 ; H01L21/26

Abstract:
An assembly present in an ion source for supporting an arc chamber upon a base plate includes a first arc support plate, a first screw, and a second screw. The first screw passes through a smooth through-hole in an arm of the first arc support plate and extends into a bore in the base plate. The second (or adjustable) screw passes through a threaded through-hole in an arm of the first arc support plate and engages an upper surface of the base plate itself, and can be used to change the altitude and angle of the first arc support plate relative to the base plate. This adjustment ability improves the beam quality of the ion source.
Public/Granted literature
- US20220336181A1 ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE Public/Granted day:2022-10-20
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