Invention Grant
- Patent Title: Onium salt-containing treatment liquid for semiconductor wafers
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Application No.: US17419058Application Date: 2020-02-13
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Publication No.: US12024663B2Publication Date: 2024-07-02
- Inventor: Yuki Kikkawa , Tomoaki Sato , Takafumi Shimoda , Takayuki Negishi
- Applicant: TOKUYAMA CORPORATION
- Applicant Address: JP Yamaguchi
- Assignee: TOKUYAMA CORPORATION
- Current Assignee: TOKUYAMA CORPORATION
- Current Assignee Address: JP Yamaguchi
- Agency: WENDEROTH, LIND & PONACK, L.L.P.
- Priority: JP 19024016 2019.02.13 JP 19045761 2019.03.13 JP 19093194 2019.05.16 JP 19110984 2019.06.14
- International Application: PCT/JP2020/005663 2020.02.13
- International Announcement: WO2020/166677A 2020.08.20
- Date entered country: 2021-06-28
- Main IPC: C09K13/06
- IPC: C09K13/06 ; H01L21/304
Abstract:
Provided is a treatment liquid for a semiconductor wafer or the like used in a process for forming a semiconductor. Namely a treatment liquid containing (A) a hypochlorite ion, and (B) an alkylammonium salt expressed by the following Formula (1), or the like is provided.
(In the Formula, “a” is an integer from 6 to 20; R1, R2, and R3 are independently, for example, an alkyl group with a carbon number from 1 to 20; and X− is, for example, a chloride ion.).
(In the Formula, “a” is an integer from 6 to 20; R1, R2, and R3 are independently, for example, an alkyl group with a carbon number from 1 to 20; and X− is, for example, a chloride ion.).
Public/Granted literature
- US20220073820A1 ONIUM SALT-CONTAINING TREATMENT LIQUID FOR SEMICONDUCTOR WAFERS Public/Granted day:2022-03-10
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