Invention Grant
- Patent Title: Atomic layer deposition part coating chamber
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Application No.: US17470294Application Date: 2021-09-09
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Publication No.: US12074010B2Publication Date: 2024-08-27
- Inventor: Michael R. Rice , Hanish Kumar Panavalappil Kumarankutty , Steven D. Marcus , Kirubanandan Naina Shanmugam , Sriharsha Dharmapura Sathyanarayanamurthy , Madhukar Krishna , Shivaprakash Padadayya Hiremath , Senthil Kumar Nattamai Subramanian , Sankar Menon Cherubala Pathayapura
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: MOSER TABOA
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; C23C16/458 ; C23C16/46

Abstract:
Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.
Public/Granted literature
- US20230074149A1 ATOMIC LAYER DEPOSITION PART COATING CHAMBER Public/Granted day:2023-03-09
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