Invention Grant
- Patent Title: Multi-beam inspection apparatus
-
Application No.: US17583176Application Date: 2022-01-24
-
Publication No.: US12142453B2Publication Date: 2024-11-12
- Inventor: Weiming Ren , Qian Zhang , Xuerang Hu , Xuedong Liu
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/244 ; H01J37/28 ; H01J37/317

Abstract:
A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.
Public/Granted literature
- US20220216029A1 MULTI-BEAM INSPECTION APPARATUS Public/Granted day:2022-07-07
Information query