Invention Application
- Patent Title: Apparatus and method for removing coating film
- Patent Title (中): 去除涂膜的设备和方法
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Application No.: US10920407Application Date: 2004-08-18
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Publication No.: US20050067100A1Publication Date: 2005-03-31
- Inventor: Shinji Kobayashi , Norihisa Koga
- Applicant: Shinji Kobayashi , Norihisa Koga
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2003-337604 20030929
- Main IPC: G03F7/42
- IPC: G03F7/42 ; B05C11/04 ; B05C11/10 ; B05C13/00 ; B05D3/10 ; C03C17/00 ; C23F1/00 ; G03F7/16 ; H01L21/027

Abstract:
An apparatus and a method for removing a coating film capable of stable treatment for removing unnecessary coating film at a substrate edge are provided. A substrate is clamped by approach stages from front and rear directions on a chuck, and fixed when accurate registration thereof is achieved. Then, the substrate edge is moved back and forth together with the chuck and the approach stage, so that the edge of the substrate is introduced in a space between an upper piece and a lower piece of a fixed arm portion. While the substrate is being moved, a solvent is fed from a nozzle portion onto a surface thereof and a purge gas is fed through a purge gas feeding pipe, so as to remove the coating film from the surface of the substrate by sucking and discharging the solvent and dissolved coating film through a discharge pipe.
Public/Granted literature
- US07641763B2 Apparatus and method for removing coating film Public/Granted day:2010-01-05
Information query
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