Invention Application
- Patent Title: Focused-beam ellipsometer
- Patent Title (中): 聚焦光椭圆仪
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Application No.: US12308662Application Date: 2007-06-20
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Publication No.: US20100045985A1Publication Date: 2010-02-25
- Inventor: Joong Whan Lee , Young June Ko , Young Sun Park , Yoon Jong Park , Chi Woon Jeong , Sang Heon Ye , Yong Jai Cho , Hyun Mo Cho , Won Chegal
- Applicant: Joong Whan Lee , Young June Ko , Young Sun Park , Yoon Jong Park , Chi Woon Jeong , Sang Heon Ye , Yong Jai Cho , Hyun Mo Cho , Won Chegal
- Priority: KR10-2006-0056275 20060622
- International Application: PCT/KR2007/002992 WO 20070620
- Main IPC: G01J4/00
- IPC: G01J4/00
Abstract:
The present invention relates to an ellipsometer, and more particularly, to an ellipsometer to find out the optical properties of the sample by analyzing the variation of the polarization of a light which has specific polarisation then reflected on a surface of the sample.
Public/Granted literature
- US08004677B2 Focused-beam ellipsometer Public/Granted day:2011-08-23
Information query
