Invention Application
- Patent Title: METHOD FOR FORMING THIN FILM PATTERN
- Patent Title (中): 形成薄膜图案的方法
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Application No.: US14500767Application Date: 2014-09-29
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Publication No.: US20150017321A1Publication Date: 2015-01-15
- Inventor: Syuji KUDO , Michinobu MIZUMURA , Koichi KAJIYAMA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
- Applicant: V TECHNOLOGY CO., LTD.
- Priority: JP2012-079207 20120330; JP2012-264451 20121203
- Main IPC: H01M4/00
- IPC: H01M4/00

Abstract:
To provide a method for forming a thin film pattern 14 having a predetermined shape on a surface of a substrate 1 having an electrode formed in advance in a thin film pattern forming region, there are included the steps of: bringing a resin film 2, which transmits visible light, into close contact with the substrate 1; irradiating the thin film pattern forming region 11 on the substrate 1 with laser light L, thereby forming an opening pattern 21 having the same shape as the thin film pattern 14 in the film 2; forming the thin film pattern 14 in the thin film pattern forming region 11 on the substrate 1 through the opening pattern 21 of the film 2; and peeling off the film 2.
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