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Patent Agency Ranking
公开(公告)号：US20160194745A1
公开(公告)日：2016-07-07
申请号：US15071125
申请日：2016-03-15
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
IPC: C23C14/04 , B23K26/00 , B23K26/342 , H01L51/00
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
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2.发明申请DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN 有权沉积掩模，其薄膜形成方法及其形成方法公开(公告)号：US20140199808A1
公开(公告)日：2014-07-17
申请号：US14214428
申请日：2014-03-14
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
Abstract translation: 用于通过沉积在基板上形成具有预定形状的薄膜图案的沉积掩模包括透射可见光并具有穿透树脂膜的开口图案并具有与薄膜相同的形状和尺寸的树脂膜 图案，以对应于基板上的薄膜图案的预先确定的形成区域。
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公开(公告)号：US20150017321A1
公开(公告)日：2015-01-15
申请号：US14500767
申请日：2014-09-29
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Syuji KUDO , Michinobu MIZUMURA , Koichi KAJIYAMA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
IPC: H01M4/00
CPC classification number: H01M4/00 , H01L27/3211 , H01L51/0016
Abstract: To provide a method for forming a thin film pattern 14 having a predetermined shape on a surface of a substrate 1 having an electrode formed in advance in a thin film pattern forming region, there are included the steps of: bringing a resin film 2, which transmits visible light, into close contact with the substrate 1; irradiating the thin film pattern forming region 11 on the substrate 1 with laser light L, thereby forming an opening pattern 21 having the same shape as the thin film pattern 14 in the film 2; forming the thin film pattern 14 in the thin film pattern forming region 11 on the substrate 1 through the opening pattern 21 of the film 2; and peeling off the film 2.
Abstract translation: 为了提供在具有预先形成在薄膜图案形成区域中的电极的基板1的表面上形成具有预定形状的薄膜图案14的方法，包括以下步骤：使树脂膜2 透射可见光，与基板1紧密接触; 用激光L对基板1上的薄膜图案形成区域11进行照射，从而形成与膜2中的薄膜图案14相同形状的开口图案21; 通过膜2的开口图案21在基板1上的薄膜图案形成区域11中形成薄膜图案14; 并剥离薄膜2。
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4.发明申请DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN 有权沉积掩模，其薄膜形成方法及其形成方法公开(公告)号：US20150284839A1
公开(公告)日：2015-10-08
申请号：US14746727
申请日：2015-06-22
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
Abstract translation: 用于通过沉积在基板上形成具有预定形状的薄膜图案的沉积掩模包括透射可见光并具有穿透树脂膜的开口图案并具有与薄膜相同的形状和尺寸的树脂膜 图案，以对应于基板上的薄膜图案的预先确定的形成区域。
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公开(公告)号：US20160193623A1
公开(公告)日：2016-07-07
申请号：US15071116
申请日：2016-03-15
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
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