Invention Application
- Patent Title: Apparatus of Plural Charged-Particle Beams
- Patent Title (中): 多次充电粒子束装置
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Application No.: US15078369Application Date: 2016-03-23
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Publication No.: US20160284505A1Publication Date: 2016-09-29
- Inventor: Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen , Jack Jau
- Applicant: Hermes Microvision Inc.
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/22 ; H01J37/06 ; H01J37/20 ; H01J37/10

Abstract:
A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
Public/Granted literature
- US10236156B2 Apparatus of plural charged-particle beams Public/Granted day:2019-03-19
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