Invention Application
- Patent Title: LOW TEMPERATURE ALD OF METAL OXIDES
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Application No.: US16739992Application Date: 2020-01-10
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Publication No.: US20200149158A1Publication Date: 2020-05-14
- Inventor: Muthukumar Kaliappan , Michael Haverty , Aaron Dangerfield , Stephen Weeks , Bhaskar Jyoti Bhuyan , Mark Saly
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455

Abstract:
Methods for depositing metal oxide layers on metal surfaces are described. The methods include exposing a substrate to separate doses of a metal precursor, which does not contain metal-oxygen bonds, and a modified alcohol with an electron withdrawing group positioned relative to a beta carbon so as to increase the acidity of a beta hydrogen attached to the beta carbon. These methods do not oxidize the underlying metal layer and are able to be performed at lower temperatures than processes performed with water or without modified alcohols.
Information query
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