• Patent Title: SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND MANUFACTURING METHOD
  • Application No.: US17915094
    Application Date: 2020-12-14
  • Publication No.: US20230154775A1
    Publication Date: 2023-05-18
  • Inventor: Yuji EGUCHIKohei SEYAMA
  • Applicant: SHINKAWA LTD.
  • Applicant Address: JP Tokyo
  • Assignee: SHINKAWA LTD.
  • Current Assignee: SHINKAWA LTD.
  • Current Assignee Address: JP Tokyo
  • International Application: PCT/JP2020/046618 2020.12.14
  • Date entered country: 2022-09-27
  • Main IPC: H01L21/67
  • IPC: H01L21/67 H01L21/687
SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND MANUFACTURING METHOD
Abstract:
A semiconductor device manufacturing device (10) includes a stage (12), an installing head (14) that has a chip holding surface (26) and disposes a chip (100) on a substrate (110), a measuring mechanism (16) that measures a tilt angle of the chip (100) loaded on an installing surface (112) of the substrate (110) by the installing head (14) with respect to the installing surface (112) as a detection tilt angle Sd, a holding surface adjusting mechanism (18) that changes a holding surface tilt angle Sb which is a tilt angle of the chip holding surface (26) with respect to a loading surface (21), and a controller (20) that calculates a correction amount C of the holding surface tilt angle Sb based on the detection tilt angle Sd and changes the holding surface tilt angle Sb by the holding surface adjusting mechanism (18) according to the calculated correction amount C.
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