Invention Application
- Patent Title: METHOD FOR MANUFACTURING A SILICON-BASED TIMEPIECE COMPONENT
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Application No.: US17912007Application Date: 2021-03-16
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Publication No.: US20230126149A1Publication Date: 2023-04-27
- Inventor: Jean-Luc BUCAILLE , Sylvain JEANNERET
- Applicant: PATEK PHILIPPE SA GENEVE
- Applicant Address: CH Genève
- Assignee: PATEK PHILIPPE SA GENEVE
- Current Assignee: PATEK PHILIPPE SA GENEVE
- Current Assignee Address: CH Genève
- Priority: EP20164297.2 20200319
- International Application: PCT/IB2021/052155 WO 20210316
- Main IPC: G04B31/06
- IPC: G04B31/06 ; G03F7/20 ; G03F7/075 ; G03F1/80 ; G04B17/04 ; G04B17/22 ; G04B17/32 ; G04B19/04 ; G04B19/06 ; G04D3/00

Abstract:
Disclosed is a method for manufacturing a horological component according to which a silicon-based piece having the desired shape of the horological component is produced and the piece is subjected to a thermal oxidation and deoxidation treatment to remove a predetermined thickness of silicon in order to increase the mechanical strength of the piece. This method is characterized in that the thermal oxidation and deoxidation treatment is carried out in several steps, each step including a thermal oxidation phase followed by a deoxidation phase.
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