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公开(公告)号：US20210109483A1
公开(公告)日：2021-04-15
申请号：US17047936
申请日：2018-12-18
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Sylvain JEANNERET , Frédéric MAIER , Jean-Luc BUCAILLE
Abstract: A method for producing a timepiece spring includes the following steps: producing a piece based on silicon, having the desired shape of the timepiece spring; thermally oxidising the piece; deoxidising the piece; annealing the piece in a reducing atmosphere; forming a silicon oxide layer on the piece.
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公开(公告)号：US20210003971A1
公开(公告)日：2021-01-07
申请号：US16980124
申请日：2019-03-15
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Frédéric MAIER , Sylvain JEANNERET
Abstract: The method for manufacturing timepiece hairsprings according to the invention comprises the following successive steps: a) forming hairsprings in a wafer, b) forming a thermal compensation layer on the hairsprings, c) identifying the hairsprings having a stiffness within a predetermined range, d) optionally, detaching from the wafer the hairsprings identified in step c), e) modifying the other hairsprings so that the stiffness of at least some of them is within the predetermined range, f) detaching from the wafer these other hairsprings and, if they have not been detached in step d), the hairsprings identified in step c). This method makes it possible to reduce manufacturing dispersions between the hairsprings.
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Patent Agency Ranking
公开(公告)号：US20140096392A1
公开(公告)日：2014-04-10
申请号：US14103243
申请日：2013-12-11
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Frédéric MAIER , Stéphane VON GUNTEN , Sylvain JEANNERET
IPC: G04D3/00
CPC classification number: G04D3/00 , B81B2201/035 , B81C99/0085 , B81C99/0095 , G04B5/165 , G04B13/02 , G04B13/022 , G04B13/026 , G04B17/063 , G04D3/0069 , G04F7/08 , Y10T29/49579 , Y10T29/49581
Abstract: A method of manufacturing a timepiece component, such as a balance, an oscillating mass or a wheel, comprises a micro-manufacturing technique, such as the DRIE technique. The method may comprise forming at least one member in or at the periphery of the structure, of a material different from that of the structure. This member is typically metal and is formed by electro-forming using a cavity of the structure as a mold.
Abstract translation: 制造诸如天平，振动块或车轮的钟表件的方法包括诸如DRIE技术的微制造技术。 该方法可以包括在结构中或其周围的至少一个构件上形成不同于该结构材料的材料。 该构件通常是金属，并且通过使用结构的空腔作为模具进行电成型而形成。
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公开(公告)号：US20240103442A1
公开(公告)日：2024-03-28
申请号：US18533303
申请日：2023-12-08
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Sylvain JEANNERET
CPC classification number: G04B17/066 , C23C14/08 , C23C16/401 , G04B17/22 , G04B17/227 , G04D3/00
Abstract: Disclosed is a support member for supporting a wafer during a heat treatment of the wafer. The support member includes a support plate and spacers and retaining elements carried by the support plate. The spacers serve to maintain a gap between the support plate and the wafer. The retaining elements serve to prevent the wafer from moving horizontally. The support plate may be made of silicon, quartz or silicon carbide. The spacers and the retaining elements may be fixed to the support plate by bayonet-type connections.
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公开(公告)号：US20230126149A1
公开(公告)日：2023-04-27
申请号：US17912007
申请日：2021-03-16
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Jean-Luc BUCAILLE , Sylvain JEANNERET
IPC: G04B31/06 , G03F7/20 , G03F7/075 , G03F1/80 , G04B17/04 , G04B17/22 , G04B17/32 , G04B19/04 , G04B19/06 , G04D3/00
Abstract: Disclosed is a method for manufacturing a horological component according to which a silicon-based piece having the desired shape of the horological component is produced and the piece is subjected to a thermal oxidation and deoxidation treatment to remove a predetermined thickness of silicon in order to increase the mechanical strength of the piece. This method is characterized in that the thermal oxidation and deoxidation treatment is carried out in several steps, each step including a thermal oxidation phase followed by a deoxidation phase.
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公开(公告)号：US20210034015A1
公开(公告)日：2021-02-04
申请号：US16968056
申请日：2019-02-04
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Julien PERRET , Rémy FOURNIER , Sylvain JEANNERET
Abstract: The micromechanical clockwork part is cut from a plate-like silicon substrate. The cut edges of the part include portions intended to serve as contact surfaces arranged to slide against corresponding contact zones of another micromechanical part in a clockwork piece. The cut edges have a ribbed surface including an alternating set of ribs and furrows, the ribs and the furrows being straight and each contained in a plane parallel to the plate. Moreover, the ribs and furrows which the cut edges have form a stepped pattern on the cut edge, with first intervals in which the spacing separating the ribs from one another is equal to a first distance, and at least one second interval in which the spacing between the ribs is equal to a second distance different from the first distance.
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公开(公告)号：US20210026299A1
公开(公告)日：2021-01-28
申请号：US16980126
申请日：2019-03-19
Applicant: PATEK PHILIPPE SA GENEVE
Inventor： Sylvain JEANNERET
Abstract: Disclosed is a method including the following steps: a) providing a substrate including a first silicon layer, a second silicon layer and an intermediate silicon oxide layer therebetween; b) etching the first silicon layer in order to form the timepiece components therein; c) releasing from the substrate a wafer formed by at least all or part of the etched, first silicon layer and including the timepiece components; d) thermally oxidizing and then deoxidizing the timepiece components; e) forming by thermal oxidation or deposition a silicon oxide layer on the timepiece components; f) detaching the timepiece components from the wafer.
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