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公开(公告)号:US20230126149A1
公开(公告)日:2023-04-27
申请号:US17912007
申请日:2021-03-16
Applicant: PATEK PHILIPPE SA GENEVE
Inventor: Jean-Luc BUCAILLE , Sylvain JEANNERET
IPC: G04B31/06 , G03F7/20 , G03F7/075 , G03F1/80 , G04B17/04 , G04B17/22 , G04B17/32 , G04B19/04 , G04B19/06 , G04D3/00
Abstract: Disclosed is a method for manufacturing a horological component according to which a silicon-based piece having the desired shape of the horological component is produced and the piece is subjected to a thermal oxidation and deoxidation treatment to remove a predetermined thickness of silicon in order to increase the mechanical strength of the piece. This method is characterized in that the thermal oxidation and deoxidation treatment is carried out in several steps, each step including a thermal oxidation phase followed by a deoxidation phase.
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公开(公告)号:US20220326657A1
公开(公告)日:2022-10-13
申请号:US17761976
申请日:2020-09-08
Applicant: PATEK PHILIPPE SA GENEVE
Inventor: Jean-Luc BUCAILLE
Abstract: Disclosed is a method of making a timepiece spring from monocrystalline material including the following steps: drawing the spring; identifying one or more zones of weakness of the spring in which or in at least one of which the spring will break in the event of excessive deformation; manufacturing the spring from a wafer of monocrystalline material extending in a determined plane, while orienting the spring in the wafer such that the direction of the macroscopic stresses in the or each zone of weakness when the spring is deformed is substantially parallel to a plane of cleavage of the material intersecting the determined plane. Also disclosed is a timepiece spring obtained by such a method.
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公开(公告)号:US20210109483A1
公开(公告)日:2021-04-15
申请号:US17047936
申请日:2018-12-18
Applicant: PATEK PHILIPPE SA GENEVE
Inventor: Sylvain JEANNERET , Frédéric MAIER , Jean-Luc BUCAILLE
Abstract: A method for producing a timepiece spring includes the following steps: producing a piece based on silicon, having the desired shape of the timepiece spring; thermally oxidising the piece; deoxidising the piece; annealing the piece in a reducing atmosphere; forming a silicon oxide layer on the piece.
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公开(公告)号:US20190049900A1
公开(公告)日:2019-02-14
申请号:US16078952
申请日:2017-03-15
Applicant: PATEK PHILIPPE SA GENEVE
Inventor: Jean-Luc BUCAILLE
Abstract: In an oscillator for a timepiece including a balance and a hairspring, the balance lacks equilibrium, such that: the curves for running of the oscillator owing to weight of the hairspring as a function of the oscillation amplitude of the balance in at least four vertical positions of the oscillator spaced by 90° each pass through 0 at an oscillation amplitude of the balance between 200° and 240°; and between oscillation amplitudes of 150° and 280°, curves representing the running of the oscillator owing to lack of equilibrium in the balance as a function of the oscillation amplitude in the vertical positions each has an average slope of opposite sign to the average slope of the corresponding curve among the curves representing the running of the oscillator owing to the weight of the hairspring. A reduction in the running discrepancies between the vertical positions can thus be achieved.
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