Invention Publication
- Patent Title: METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
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Application No.: US17829230Application Date: 2022-05-31
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Publication No.: US20240096586A1Publication Date: 2024-03-21
- Inventor: Xinrong JIANG , Christopher SEARS , Youfei JIANG , Sameet K. SHRIYAN , Jeong Ho LEE , Michael STEIGERWALD , Ralph NYFFENEGGER
- Applicant: KLA CORPORATION
- Applicant Address: US CA Milpitas
- Assignee: KLA CORPORATION
- Current Assignee: KLA CORPORATION
- Current Assignee Address: US CA Milpitas
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/06 ; H01J37/12 ; H01J37/244 ; H01J37/28

Abstract:
A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.
Public/Granted literature
- US12165831B2 Method and system of image-forming multi-electron beams Public/Granted day:2024-12-10
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