公开(公告)号：US20230245933A1

公开(公告)日：2023-08-03

申请号：US17591569

申请日：2022-02-02

Applicant: KLA Corporation

Inventor： Youfei JIANG ,  Michael STEIGERWALD ,  Christopher SEARS

IPC: H01L21/66 ,  H01J37/31 ,  H01J37/147 ,  H01L21/263 ,  B23K15/00 ,  B23K15/02 ,  B23K15/08

CPC classification number: H01L22/26 ,  H01J37/31 ,  H01J37/1474 ,  H01L21/2633 ,  B23K15/0013 ,  B23K15/002 ,  B23K15/0006 ,  B23K15/02 ,  B23K15/08 ,  B23K2103/56

Abstract: The dual focused ion beam and scanning electron beam system includes an electron source that generates an electron beam and an ion source that generates an ion beam. The electron beam column directs an electron beam at a normal angle relative to a top surface of the stage. An ion beam column directs the ion beam at the stage. The ion beam is at an angle relative to the electron beam. A detector receives the electron beam reflected from the wafer on the stage.

公开(公告)号：US20240096586A1

公开(公告)日：2024-03-21

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong JIANG ,  Christopher SEARS ,  Youfei JIANG ,  Sameet K. SHRIYAN ,  Jeong Ho LEE ,  Michael STEIGERWALD ,  Ralph NYFFENEGGER

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/04735 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/1532 ,  H01J2237/1536 ,  H01J2237/2448

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.