Invention Grant
- Patent Title: Thermosensitive etch resist for forming a mask
- Patent Title (中): 用于形成掩模的热敏蚀刻抗蚀剂
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Application No.: US858977Application Date: 1997-05-20
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Publication No.: US5958647APublication Date: 1999-09-28
- Inventor: David A. Morgan
- Applicant: David A. Morgan
- Assignee: Morgan; David A.
- Current Assignee: Morgan; David A.
- Main IPC: G03C1/498
- IPC: G03C1/498 ; H05K3/06 ; G03C1/73
Abstract:
A thermosensitive resist used in the manufacturing of printed circuit boards comprising a mixture of polyacrylic acid, a salt of a long chain fatty acid such as silver behenate, an infra-red absorber and modifiers such as additional polymers. In the unheated form the resist can be easily washed away with water-based mild solutions or pure water. When selectively heated by an IR laser a non-soluble, etch resistant composition is formed protecting the copper clad printed circuit board from the etchants used in the process.
Public/Granted literature
- US5304362A Method in cleaning flue gas in a PFBC plant including a gas turbine driven thereby Public/Granted day:1994-04-19
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