Invention Grant
US06768118B2 Electron beam monitoring sensor and electron beam monitoring method
有权
电子束监测传感器和电子束监测方法
- Patent Title: Electron beam monitoring sensor and electron beam monitoring method
- Patent Title (中): 电子束监测传感器和电子束监测方法
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Application No.: US10350188Application Date: 2003-01-24
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Publication No.: US06768118B2Publication Date: 2004-07-27
- Inventor: Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
- Applicant: Yoshinori Nakayama , Yasunari Sohda , Hiroya Ohta , Norio Saitou , Masato Muraki , Masaki Takakuwa
- Priority: JP2002-231208 20020808
- Main IPC: H01J326
- IPC: H01J326
Abstract:
The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.
Public/Granted literature
- US20040026627A1 Electron beam monitoring sensor and electron beam monitoring method Public/Granted day:2004-02-12
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