公开(公告)号：US06803583B2

公开(公告)日：2004-10-12

申请号：US09812880

申请日：2001-03-21

Applicant: Myron Eugene Taylor

Inventor： Myron Eugene Taylor

IPC: H01J326

CPC classification number: H01J37/244 ,  G01N23/04

Abstract: A scintillator for an electron microscope includes a substrate (24) of optically transparent material in disc shaped form, a retaining ring (20) of highly conductive material having a non-oxidizing surface around the substrate and having a radially inwardly extending lip (22) on one end, a coating of indium tin oxide (26) on surface (28) of the substrate, electrically conductive adhesive material (32) between the lip and the radially outer part of the coating, and scintillator material (36) bonded to surface (38) of the coating. The indium tin oxide coating may be applied by sputtering and the scintillator material may br deposited onto the coating by settlement deposition. All contacting surfaces are intimately bonded to provide maximum conductivity resulting in better signal to noise ratio. The conductive substrate minimizes pinhole interference, the scintillator is easier to handle during installation and no aluminum overcoating is required.

Abstract translation: 一种用于电子显微镜的闪烁体，包括光盘透明材料的盘状基板（24），高导电材料的保持环（20），具有围绕基片的非氧化性表面，并具有径向向内延伸的唇缘（22） 在一端上，衬底的表面（28）上的氧化铟锡（26）的涂层，在唇缘和涂层的径向外部之间的导电粘合剂材料（32）和结合到表面的闪烁体材料（36） （38）。 铟锡氧化物涂层可以通过溅射施加，并且闪烁体材料可以通过沉降沉积而沉积到涂层上。 所有接触表面紧密结合以提供最大导电率，从而获得更好的信噪比。 导电基板最小化针孔干扰，闪烁体在安装过程中更容易处理，不需要铝复涂。

公开(公告)号：US06768118B2

公开(公告)日：2004-07-27

申请号：US10350188

申请日：2003-01-24

Applicant: Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

Inventor： Yoshinori Nakayama ,  Yasunari Sohda ,  Hiroya Ohta ,  Norio Saitou ,  Masato Muraki ,  Masaki Takakuwa

IPC: H01J326

CPC classification number: H01J37/244 ,  H01J2237/24405 ,  H01J2237/31774

Abstract: The present invention provides a beam monitoring sensor which can offer both high beam monitoring precision and high speed monitoring in a multi-electron beam writing system and a monitoring method using the same. In a Faraday cup for electron beam monitoring, tantalum or a heavy metal material having an atomic number larger than that of tantalum is used to provide a Faraday cup construction having a high aspect ratio. The micro Faraday cup permits electron beam monitoring having less beam leak to a high acceleration electron beam.

Abstract translation: 本发明提供了一种能够在多电子束书写系统中提供远光监测精度和高速监测的光束监测传感器以及使用其的监测方法。在用于电子束监测的法拉第杯中，钽或重金属 使用原子序数大于钽的材料来提供具有高纵横比的法拉第杯结构。 微法拉第杯允许电子束监测具有较少的光束泄漏到高加速度电子束。

公开(公告)号：US06635882B1

公开(公告)日：2003-10-21

申请号：US09889209

申请日：2001-09-25

Applicant: Marius Pavlovic ,  Dieter Schardt

Inventor： Marius Pavlovic ,  Dieter Schardt

IPC: H01J326

CPC classification number: A61N5/1081 ,  A61N5/10 ,  A61N2005/1087 ,  G21K5/04

Abstract: The invention relates to a gantry system for adjusting and aligning an ion beam onto a target from a freely determinable effective treatment angle. The ion beam therein is introduced in the horizontally arranged gantry rotation axis of the gantry system and is firstly deflected away from the gantry rotation axis by means of magnetic optics. The ion beam is then so aligned onto a target at adjustable angles of from 0 to 360° around the gantry rotation axis that the ion beam intersects the gantry rotation axis in the isocentre of the gantry system. Besides the gantry, the gantry system has a target carrier system having a rotatable target carrier, the carrier rotation axis of which is arranged in the isocentre in a vertical direction with the respect to the gantry rotation axis. The final deflection magnet so deflects the ion beam that the ion beam intersects the gantry rotation axis in the isocentre at an angle of between greater than or equal to 45° and less than 90°. Consequently, the ion beam can describe the surface of a cone when the gantry is rotated a full revolution about the gantry rotation axis. The target carrier system has a target carrier for each of two positions, which are perpendicular to one another in a vertical plane, it being possible to bring the carrier rotation axis into the isocentre of the gantry system. Furthermore, the invention relates to a method for irradiating a tumour from freely determinable effective treatment angles by means of the gantry system described above.

Abstract translation: 本发明涉及一种用于从可自由确定的有效治疗角度将离子束调整和对准靶子的台架系统。 其中的离子束被引入台架系统的水平布置的龙门架旋转轴中，并且首先通过磁光学器件从机架旋转轴线偏转。 离子束然后在机架旋转轴周围以0至360°的可调节角度对齐到目标上，离子束与台架系统的等角中的机架旋转轴相交。 除了龙门架之外，龙门架系统具有目标托架系统，该目标托架系统具有可旋转的目标托架，托架旋转轴线相对于台架旋转轴线在垂直方向上布置在等角中。 最终的偏转磁体使得离子束以等于或等于45°且小于90°的角度在等角中与离子束相交的离子束偏转。 因此，当机架围绕机架旋转轴线旋转一圈时，离子束可以描述锥体的表面。 目标载体系统具有用于在垂直平面中彼此垂直的两个位置中的每一个的目标载体，可以使载体旋转轴进入台架系统的等中心。 此外，本发明涉及通过上述台架系统从可自由确定的有效治疗角度照射肿瘤的方法。

公开(公告)号：US06586753B2

公开(公告)日：2003-07-01

申请号：US10270068

申请日：2002-10-15

Applicant: Yasumitsu Wada

Inventor： Yasumitsu Wada

IPC: H01J326

CPC classification number: H01J37/26 ,  H01J2237/153 ,  H01J2237/282

Abstract: An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.

Abstract translation: 用于用电子束照射靶的电子束装置包括：参考样本，其包括在参考样本的评估表面中具有沿着圆周设置的多个格子结构的至少一个参考图案; 以及调整部，其基于从参考样品产生的电子，通过用电子束照射评价面来调整电子束。

公开(公告)号：US06509569B1

公开(公告)日：2003-01-21

申请号：US09690425

申请日：2000-10-17

Applicant: Jurgen Frosien

Inventor： Jurgen Frosien

IPC: H01J326

CPC classification number: H01J37/147 ,  H01J37/05

Abstract: A deflection arrangement for separating two parties beams has an electrostatic deflector and a magnetic deflector having a common optical axis and generating crossed electrostatic and magnetic deflection fields, wherein the two particle beams pass the deflection arrangements from opposite sides. The two deflectors are adapted to deflect one of the two beams achromatically by an angle s and the ocher beam by an angle &bgr;≧3&agr; with respect to its angle of incidence, respectively.

Abstract translation: 用于分离双方光束的偏转装置具有静电偏转器和具有公共光轴的磁偏转器并产生交叉的静电和磁偏转场，其中两个粒子束从相对侧通过偏转装置。 两个偏转器适于使两个光束中的一个光束相对于其入射角分别以角度s和赭色光束成角度β> 3alpha的方式偏转。