Invention Grant
- Patent Title: Multiple beam ellipsometer
- Patent Title (中): 多光束椭偏仪
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Application No.: US11256841Application Date: 2005-10-24
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Publication No.: US07136164B2Publication Date: 2006-11-14
- Inventor: Martin Ebert , Li Chen
- Applicant: Martin Ebert , Li Chen
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Stallman & Pollock LLP
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and, consequently, a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.
Public/Granted literature
- US20060033914A1 Multiple beam ellipsometer Public/Granted day:2006-02-16
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