Invention Grant
US07326437B2 Method and system for coating polymer solution on a substrate in a solvent saturated chamber
有权
在溶剂饱和室中在基材上涂覆聚合物溶液的方法和系统
- Patent Title: Method and system for coating polymer solution on a substrate in a solvent saturated chamber
- Patent Title (中): 在溶剂饱和室中在基材上涂覆聚合物溶液的方法和系统
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Application No.: US10748457Application Date: 2003-12-29
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Publication No.: US07326437B2Publication Date: 2008-02-05
- Inventor: Andrew Nguyen
- Applicant: Andrew Nguyen
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: B05D3/12
- IPC: B05D3/12 ; B05D3/04

Abstract:
A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.
Public/Granted literature
- US20050147748A1 Method and system for coating polymer solution on a substrate in a solvent saturated chamber Public/Granted day:2005-07-07
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