Invention Grant
- Patent Title: Systems and methods for optical measurement
- Patent Title (中): 光学测量的系统和方法
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Application No.: US11322540Application Date: 2005-12-30
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Publication No.: US07349086B2Publication Date: 2008-03-25
- Inventor: Joung-Wei Liou , Jacky Huang , Chih-Ming Ke , Szu-An Wu
- Applicant: Joung-Wei Liou , Jacky Huang , Chih-Ming Ke , Szu-An Wu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Thomas, Kayden, Horstemeyer & Risley
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
A system for measuring optical properties of a sample is provided. A light source provides incident polarized light. A detector detects reflected light from the sample surface. A processor determines a first coefficient (R) of the reflected light detected by the detector, determines a second coefficient (n), extinction coefficient (k), and thickness of the film based on the measured first coefficient, and determines a first dielectric constant (∈1) and a second dielectric constant (∈2) of the film according to the second coefficient (n) and extinction coefficient (k).
Public/Granted literature
- US20070153272A1 Systems and methods for optical measurement Public/Granted day:2007-07-05
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