Invention Grant
- Patent Title: Method of forming pattern by utilizing coatable inorganic material
- Patent Title (中): 利用可涂覆无机材料形成图案的方法
-
Application No.: US11675640Application Date: 2007-02-16
-
Publication No.: US07741004B2Publication Date: 2010-06-22
- Inventor: Chin-Tien Yang , Ming-Fang Hsu , Sheng-Li Chang , Tzuan-Ren Jeng
- Applicant: Chin-Tien Yang , Ming-Fang Hsu , Sheng-Li Chang , Tzuan-Ren Jeng
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW95149219A 20061227
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; B05D1/36 ; B05D7/00
Abstract:
A coatable inorganic material is provided, which is suitable for being coated on a substrate in the form of sol-gel solution and then being directly written with thermochemical mode by using a laser beam. The coatable inorganic material is an oxide, in which the chemical element constitution is more than one element selected from Te, Al, Zr, and Ti.
Public/Granted literature
- US20080160433A1 COATABLE INORGANIC MATERIAL AND METHOD OF FORMING PATTERN BY UTILIZING THE SAME Public/Granted day:2008-07-03
Information query
