Invention Grant
- Patent Title: Silica films and method of production thereof
- Patent Title (中): 二氧化硅薄膜及其制造方法
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Application No.: US10579654Application Date: 2004-11-22
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Publication No.: US07919145B2Publication Date: 2011-04-05
- Inventor: Paul Meredith , Michael Harvey , Robert Vogel
- Applicant: Paul Meredith , Michael Harvey , Robert Vogel
- Applicant Address: US CA Redwood City
- Assignee: Xerocoat Inc.
- Current Assignee: Xerocoat Inc.
- Current Assignee Address: US CA Redwood City
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: AU2003906427 20031121
- International Application: PCT/AU2004/001622 WO 20041122
- International Announcement: WO2005/049757 WO 20050602
- Main IPC: B05D3/04
- IPC: B05D3/04 ; B05D3/02
Abstract:
A method of producing a silica coating by forming a silica precursor formulation that is coated on a substrate as a continuous liquid phase. The silica precursor formulation is then cured in an ammoniacal atmosphere to produce a continuous, interconnected, nano-porous silica network.
Public/Granted literature
- US20070148435A1 Silica films and method of production thereof Public/Granted day:2007-06-28
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