Invention Grant
- Patent Title: Single polarizer focused-beam ellipsometer
- Patent Title (中): 单偏振器聚光束椭偏仪
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Application No.: US12666159Application Date: 2008-11-11
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Publication No.: US08009292B2Publication Date: 2011-08-30
- Inventor: Yong Jai Choi , Won Chegal , Hyun Mo Cho
- Applicant: Yong Jai Choi , Won Chegal , Hyun Mo Cho
- Applicant Address: KR
- Assignee: Korea Research Institute of Standards and Science
- Current Assignee: Korea Research Institute of Standards and Science
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2007-0115398 20071113
- International Application: PCT/KR2008/006640 WO 20081111
- International Announcement: WO2009/064102 WO 20090522
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
The present invention relates to a single-polarizer focused-beam ellipsometer. An ellipsometer according to the present invention includes a light source (210); a beam splitting part (220) for splitting a light generated in the light source (210) into a polarized light; an objective lens (230) for concentrately irradiating some of light split by the beam splitting part (220) onto a specimen (240); a photodetector (250) for detecting the light passed through the objective lens 230 and the beam splitting part (220) after reflected from the specimen (240) with unit cells; and a central processing unit (260) for correcting the intensity of the light detected by the photodetector (250) into a value corresponding to the unit cell of the photodetector (250) along multiple incidence plane passage of 360° with respect to respective incidence angles and processing the corrected value.
Public/Granted literature
- US20100296092A1 SINGLE-POLARIZER FOCUSED-BEAM ELLIPSOMETER Public/Granted day:2010-11-25
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