Invention Grant
- Patent Title: Method for producing a radiation-absorbing optical element and corresponding radiation absorbing optical element
- Patent Title (中): 辐射吸收光学元件和相应的辐射吸收光学元件的制造方法
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Application No.: US11662550Application Date: 2005-09-08
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Publication No.: US08021560B2Publication Date: 2011-09-20
- Inventor: Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
- Applicant: Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
- Applicant Address: DE Munich
- Assignee: Fraunhofer-Gesellshaft zur Foerderung der Angewandten Forschung E. V.
- Current Assignee: Fraunhofer-Gesellshaft zur Foerderung der Angewandten Forschung E. V.
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Priority: DE102004043871 20040910
- International Application: PCT/DE2005/001572 WO 20050908
- International Announcement: WO2006/026975 WO 20060316
- Main IPC: B44C1/22
- IPC: B44C1/22
Abstract:
In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).
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