公开(公告)号：US20080118760A1

公开(公告)日：2008-05-22

申请号：US11662550

申请日：2005-09-08

Applicant: Norbert Kaiser ,  Antje Kaless ,  Peter Munzert ,  Michael Scheler ,  Ulrike Schulz

Inventor： Norbert Kaiser ,  Antje Kaless ,  Peter Munzert ,  Michael Scheler ,  Ulrike Schulz

IPC: B05D5/06 ,  B32B15/08

CPC classification number: G02B5/003 ,  B29C59/14 ,  B29K2033/12 ,  B29K2995/0031 ,  B29L2011/00 ,  Y10T428/31678

Abstract: In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).

Abstract translation: 在制造含有塑料基片（1）的辐射吸收光学元件的方法中，在基片（1）的至少一个表面（2）上制造具有渐变折射率（4）的层，其中使用 等离子体蚀刻工艺，之后将金属层（7）施加在具有渐变折射率（4）的层的顶部上。

公开(公告)号：US08021560B2

公开(公告)日：2011-09-20

申请号：US11662550

申请日：2005-09-08

Applicant: Norbert Kaiser ,  Antje Kaless ,  Peter Munzert ,  Michael Scheler ,  Ulrike Schulz

Inventor： Norbert Kaiser ,  Antje Kaless ,  Peter Munzert ,  Michael Scheler ,  Ulrike Schulz

IPC: B44C1/22

CPC classification number: G02B5/003 ,  B29C59/14 ,  B29K2033/12 ,  B29K2995/0031 ,  B29L2011/00 ,  Y10T428/31678

Abstract: In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).

Abstract translation: 在制造含有塑料基片（1）的辐射吸收光学元件的方法中，在基片（1）的至少一个表面（2）上制造具有渐变折射率（4）的层，其中使用 等离子体蚀刻工艺，之后将金属层（7）施加在具有渐变折射率（4）的层的顶部上。

公开(公告)号：US20080096010A1

公开(公告)日：2008-04-24

申请号：US11632444

申请日：2005-05-17

Applicant: Michael Scheler ,  Wieland Stockl ,  Hein Uhlig ,  Norbert Kaiser

Inventor： Michael Scheler ,  Wieland Stockl ,  Hein Uhlig ,  Norbert Kaiser

IPC: B32B17/06

CPC classification number: C03C17/3663 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3649 ,  C03C2218/154 ,  F21V7/22 ,  G02B5/0808 ,  G02B5/085 ,  Y10T428/26

Abstract: The invention relates to a rear surface mirror having a substrate which is transparent for the light to be reflected and having a silver layer which is applied on its rear side, a first intermediate layer being introduced as underlayer between the substrate and the silver layer at least in regions, said underlayer comprising a high-melting oxide or containing the latter and having a higher melting point than silver, and a further cover layer being applied on the side of the silver layer, which is orientated away from the substrate, at least in regions, said cover layer comprising one of the high-melting metals ruthenium, iridium, osmium, palladium, platinum, rhenium and/or rhodium or containing these.

Abstract translation: 本发明涉及一种背面反射镜，其具有对被反射的光具有透明性的基板，并且具有施加在其后侧的银层，第一中间层至少在基板和银层之间作为下层引入 在区域中，所述底层包含高熔点氧化物或含有高熔点氧化物或含有高熔点氧化物并且具有比银高的熔点，并且另外的覆盖层被施加在银层的远离衬底的方向上，至少在 所述覆盖层包含高熔点金属钌，铱，锇，钯，铂，铼和/或铑中的一种或含有这些金属。

公开(公告)号：US20090261063A1

公开(公告)日：2009-10-22

申请号：US12474008

申请日：2009-05-28

Applicant: Peter Munzert ,  Michael Scheler ,  Ulrike Schulz ,  Norbert Kaiser

Inventor： Peter Munzert ,  Michael Scheler ,  Ulrike Schulz ,  Norbert Kaiser

IPC: B44C1/22

CPC classification number: B29C59/14 ,  C08J7/12 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/10 ,  C23C14/5873 ,  G02B1/12

Abstract: A nanostructure is produced at a surface of a substrate composed of a plastic by means of a plasma etching process. A thin layer is applied to the plastic substrate and the plasma etching process is subsequently carried out.

Abstract translation: 通过等离子体蚀刻工艺在由塑料构成的基板的表面上产生纳米结构。 将薄层施加到塑料基板上，随后进行等离子体蚀刻工艺。

公开(公告)号：US20050233083A1

公开(公告)日：2005-10-20

申请号：US10525444

申请日：2003-07-14

Applicant: Ulrike Schulz ,  Norbert Kaiser ,  Peter Munzert ,  Michael Scheler ,  Hein Uhlig

Inventor： Ulrike Schulz ,  Norbert Kaiser ,  Peter Munzert ,  Michael Scheler ,  Hein Uhlig

IPC: B29C59/14 ,  G02B1/12 ,  B05D3/04 ,  B05D3/10

CPC classification number: G02B1/12 ,  B29C59/14 ,  B29K2033/12 ,  B29K2995/0018 ,  B29L2011/005 ,  C08J7/123 ,  C08J2333/12 ,  C08J2369/00

Abstract: The present invention relates to a process for reducing the surface reflectance of polymer substrates by means of ion bombardment, in which at least one substrate surface is modified by means of an argon/oxygen plasma with formation of a refractive index gradient layer.

Abstract translation: 本发明涉及通过离子轰击降低聚合物基板的表面反射率的方法，其中通过形成折射率梯度层的氩/氧等离子体修饰至少一个基板表面。