Invention Grant
US08541760B2 Method for calibrating a deflection unit in a TIRF microscope, TIRF microscope, and method for operating the same 有权
用于校准TIRF显微镜中的偏转单元的方法,TIRF显微镜及其操作方法

  • Patent Title: Method for calibrating a deflection unit in a TIRF microscope, TIRF microscope, and method for operating the same
  • Patent Title (中): 用于校准TIRF显微镜中的偏转单元的方法,TIRF显微镜及其操作方法
  • Application No.: US12989493
    Application Date: 2009-04-25
  • Publication No.: US08541760B2
    Publication Date: 2013-09-24
  • Inventor: Mattias Gonschor
  • Applicant: Mattias Gonschor
  • Applicant Address: DE Jena
  • Assignee: Carl Zeiss MicroImaging GmbH
  • Current Assignee: Carl Zeiss MicroImaging GmbH
  • Current Assignee Address: DE Jena
  • Agency: Hoffman Warnick LLC
  • Priority: DE102008021577 20080430
  • International Application: PCT/EP2009/003035 WO 20090425
  • International Announcement: WO2009/132810 WO 20091105
  • Main IPC: G01J1/58
  • IPC: G01J1/58 G01J3/30 G01N21/25 G02B21/06
Method for calibrating a deflection unit in a TIRF microscope, TIRF microscope, and method for operating the same
Abstract:
The invention relates to a method for calibrating a deflection unit in a TIRF microscope, by means of which an angle of incidence of excitation light onto a specimen is adjusted, wherein a setting of said deflection unit is adjusted such that the pertaining angle of incidence is definitely greater or definitely smaller than an anticipated critical angle for total reflection of the excitation light on a surface of a used specimen, the angle of incidence is scanned by varying the setting of said deflection unit in the direction of an anticipated critical angle, an intensity of an optical response of the used specimen elicited by the excitation light being measured for each setting of the deflection unit, the intensity of the optical response of the specimen used is measured at least for a number of settings of the deflection unit until the intensity of the optical response of the specimen used traverses a flank, and the setting of the deflection unit pertaining to the flank is stored as the setting for the critical angle for total reflection at the specimen used.
Information query
Patent Agency Ranking
0/0