Invention Grant
US08652419B2 Method of manufacturing microfluidic chip, microfluidic chip, and apparatus for generating surface plasmon resonant light 有权
制造微流体芯片,微流控芯片和产生表面等离激元谐振光的装置的方法

  • Patent Title: Method of manufacturing microfluidic chip, microfluidic chip, and apparatus for generating surface plasmon resonant light
  • Patent Title (中): 制造微流体芯片,微流控芯片和产生表面等离激元谐振光的装置的方法
  • Application No.: US13758450
    Application Date: 2013-02-04
  • Publication No.: US08652419B2
    Publication Date: 2014-02-18
  • Inventor: Satoshi YamamotoTatsuo Suemasu
  • Applicant: Fujikura Ltd.
  • Applicant Address: JP Tokyo
  • Assignee: Fujikura Ltd.
  • Current Assignee: Fujikura Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2010-177948 20100806
  • Main IPC: B05D3/06
  • IPC: B05D3/06 B05D3/10
Method of manufacturing microfluidic chip, microfluidic chip, and apparatus for generating surface plasmon resonant light
Abstract:
A method of manufacturing a microfluidic chip includes: irradiating, with a laser light, an area to be provided with a valley for storing a fluid on a surface of a substrate so as to form a modified region having a periodic pattern formed in a self-organizing manner in a light-collecting area of the laser light, the laser light having a pulse width for which the pulse duration is on the order of picoseconds or less; carrying out an etching treatment on the substrate in which the modified region is formed, removing at least some of the modified portion so as to provide the valley, and forming a periodic structure having a plurality of groove portions along one direction which have a surface profile based on the periodic pattern on at least a bottom surface of the valley; and forming a metal layer that covers the periodic structure of the bottom surface.
Information query
Patent Agency Ranking
0/0