Invention Grant
- Patent Title: Techniques for marking a substrate using a physical vapor deposition material
- Patent Title (中): 使用物理气相沉积材料标记衬底的技术
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Application No.: US12868602Application Date: 2010-08-25
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Publication No.: US08663806B2Publication Date: 2014-03-04
- Inventor: Douglas Weber , Christopher Prest , David Pakula , Stephen Paul Zadesky
- Applicant: Douglas Weber , Christopher Prest , David Pakula , Stephen Paul Zadesky
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Main IPC: H05K7/00
- IPC: H05K7/00 ; B05D1/36 ; B05D3/02 ; B32B17/06 ; B32B15/04 ; B32B18/00 ; B32B15/082

Abstract:
Techniques, processes and structures are disclosed for providing markings on products, such as electronic devices. For example, the markings can be formed using physical vapor deposition (PVD) processes to deposit a layer of material. The markings or labels may be textual and/or graphic. The markings are deposited on a compliant layer that is disposed on a surface to be marked. The compliant layer is arranged to isolate the surface to be marked from the layer of material deposited using the PVD process.
Public/Granted literature
- US20110051337A1 Techniques for Marking a Substrate Using a Physical Vapor Deposition Material Public/Granted day:2011-03-03
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