Invention Grant
- Patent Title: Interference electron microscope
- Patent Title (中): 干涉电子显微镜
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Application No.: US13900589Application Date: 2013-05-23
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Publication No.: US08785851B2Publication Date: 2014-07-22
- Inventor: Toshiaki Tanigaki , Shinji Aizawa , Tsuyoshi Matsuda , Ken Harada , Yoshio Takahashi
- Applicant: Riken
- Applicant Address: JP Tokyo JP Saitama
- Assignee: Hitachi, Ltd.,Riken
- Current Assignee: Hitachi, Ltd.,Riken
- Current Assignee Address: JP Tokyo JP Saitama
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2012-118162 20120524
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/04 ; G01B15/00

Abstract:
In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.
Public/Granted literature
- US20130313432A1 INTERFERENCE ELECTRON MICROSCOPE Public/Granted day:2013-11-28
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