公开(公告)号：US11024482B2

公开(公告)日：2021-06-01

申请号：US16497738

申请日：2018-03-22

Applicant: RIKEN

Inventor： Ken Harada ,  Kodai Niitsu ,  Keiko Shimada

IPC: H01J37/22 ,  G03H1/00 ,  G03H1/04 ,  G03H1/16 ,  H01J37/20 ,  H01J37/295

Abstract: A lensless Fourier transform holography high accuracy reconstruction method using a charged particle beam apparatus which holds a sample on a diffraction surface of a diffraction grating provided on the downstream side of a traveling direction of the charged particle beam and which is formed of a material having permeability. The charged particle beam passed through the diffraction surface is image-formed, and the formed image is detected. An opening region of the diffraction grating is smaller than an irradiation region of the charged particle beam on the diffraction grating. Image data is obtained in a state where the irradiation region of the charged particle beam diffracted with the diffraction grating is within the irradiation region of the charged particle beam transmitted through the diffraction grating. Plural holograms obtained based on the image data are Fourier transformed and an intensity distribution image is displayed and stored.

公开(公告)号：US20210233741A1

公开(公告)日：2021-07-29

申请号：US17263017

申请日：2019-07-26

Applicant: RIKEN ,  UNIVERSITY PUBLIC CORPORATION OSAKA

Inventor： Ken Harada ,  Keiko Shimada ,  Shigeo Mori ,  Atsuhiro Kotani

IPC: H01J37/26 ,  H01J37/22 ,  G01N23/201 ,  H01J37/147 ,  H01J37/20 ,  H01J37/09 ,  H01J37/10

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

公开(公告)号：US11011344B2

公开(公告)日：2021-05-18

申请号：US16787662

申请日：2020-02-11

Applicant: HITACHI, LTD. ,  RIKEN

Inventor： Toshiaki Tanigaki ,  Tetsuya Akashi ,  Ken Harada

IPC: H01J37/141 ,  H01J37/26 ,  H01J37/09 ,  H01J37/147 ,  H01J37/295

Abstract: An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

公开(公告)号：US10948426B2

公开(公告)日：2021-03-16

申请号：US16094839

申请日：2017-04-06

Applicant: RIKEN

Inventor： Ken Harada ,  Keiko Shimada ,  Kodai Niitsu

IPC: G01N23/04 ,  H01J37/295 ,  G02B5/18 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

Abstract: The density difference of particle beam irradiation with two optical statuses is produced utilizing a diffraction effect, within the same field of vision, such that a diffraction grating manufactured with a material which passes through a particle beam is provided on the upper side of a specimen and on the lower side of the irradiation optical system. Further, a region wider than the opening region of the diffraction grating is irradiated with the particle beam to produce the density difference of the particle beam emitted to the specimen, by superposing the particle beam, Bragg-diffracted with the opening region, and the particle beam, transmitted through the outer peripheral part of the opening region without being diffracted, with each other, and emitting the beam to the specimen.

公开(公告)号：US11551907B2

公开(公告)日：2023-01-10

申请号：US17263017

申请日：2019-07-26

Applicant: RIKEN ,  UNIVERSITY PUBLIC CORPORATION OSAKA

Inventor： Ken Harada ,  Keiko Shimada ,  Shigeo Mori ,  Atsuhiro Kotani

IPC: H01J37/26 ,  G01N23/201 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

公开(公告)号：US10770264B2

公开(公告)日：2020-09-08

申请号：US16360812

申请日：2019-03-21

Applicant: RIKEN

Inventor： Yoh Iwasaki ,  Ken Harada ,  Keiko Shimada

IPC: H01J37/26 ,  H01J37/141 ,  H01J37/147

Abstract: An interference optical system unit includes at least one electromagnetic lens that forms an image of a charged particle beam, at least one charged particle beam biprism, and a support member for the electromagnetic lens and the charged particle beam biprism. The electromagnetic lens, the charged particle beam biprism, the support member, and a space to an image plane of the electromagnetic lens are integrally configured as one unit. The interference optical system unit is disposed to have an optical axis coaxialized with an optical axis of an imaging optical system of an upstream stage that is disposed on an upstream side of the unit in a flow direction of the charged particle beam. A focal length of the electromagnetic lens and a deflection angle of the charged particle beam given by the charged particle beam biprism are controlled to generate an interference fringe of the charged particle beam on the image plane of the electromagnetic lens.

公开(公告)号：US08785851B2

公开(公告)日：2014-07-22

申请号：US13900589

申请日：2013-05-23

Applicant: Riken

Inventor： Toshiaki Tanigaki ,  Shinji Aizawa ,  Tsuyoshi Matsuda ,  Ken Harada ,  Yoshio Takahashi

IPC: H01J37/26 ,  H01J37/04 ,  G01B15/00

CPC classification number: H01J37/261 ,  H01J37/295 ,  H01J2237/026 ,  H01J2237/1514 ,  H01J2237/2614

Abstract: In an interference electron microscope, a first electron biprism is disposed between an acceleration tube and an illumination-lens system, a mask is disposed between the acceleration tube and the first electron biprism, and the first electron biprism is arranged in a shadow that the mask forms. Current densities of first and second electron beams on a parabolic surface of an objective lens system where a sample is positioned are controlled by a control system by an optical action of the illumination-lens system, the mask is imaged on the parabolic surface of the objective lens system, and an electro-optical length between the first electron biprism and the parabolic surface of the objective lens where the sample is positioned is controlled without generating Fresnel fringes on a sample surface from the mask and the first electron biprism.

Abstract translation: 在干涉电子显微镜中，第一电子双棱镜设置在加速管与照明透镜系统之间，掩模设置在加速管与第一电子双棱镜之间，第一电子双棱镜被布置成荫罩 形式。 通过照明透镜系统的光学作用由控制系统控制样品所在的物镜系统的抛物面上的第一和第二电子束的电流密度，掩模被成像在物镜的抛物线表面上 透镜系统，并且控制样品所在的第一电子双棱镜和物镜的抛物线表面之间的电光长度，而不在掩模和第一电子双棱镜的样品表面上产生菲涅尔条纹。

公开(公告)号：US08772715B2

公开(公告)日：2014-07-08

申请号：US13869999

申请日：2013-04-25

Applicant: Riken ,  Hitachi, Ltd.

Inventor： Toshiaki Tanigaki ,  Shinji Aizawa ,  Tsuyoshi Matsuda ,  Ken Harada ,  Yoshio Takahashi

IPC: H01J37/26 ,  H01J37/04 ,  G01B15/00

CPC classification number: H01J37/22 ,  H01J37/295 ,  H01J2237/2614

Abstract: An electron beam device includes a first electron biprism between an acceleration tube and irradiation lens systems, and an electron biprism in the image forming lens system. The first electron biprism splits the electron beam into first and second electron beams, radiated to differently positioned first and second regions on an objective plane of an objective lens system having a specimen perpendicular to an optical axis. The first and second electron beams are superposed on the observation plane by the electron biprism of the image forming lens system. The superposed region is observed or recorded. Optical action of the irradiation lens system controls each current density of the first and second electron beams on the objective plane having the specimen, and distance on electron optics between the first electron biprism and the objective plane of the objective lens system having the specimen.

Abstract translation: 电子束装置包括加速管和照射透镜系统之间的第一电子双棱镜，以及成像透镜系统中的电子双棱镜。 第一电子双棱镜将电子束分裂成第一和第二电子束，辐射到具有垂直于光轴的样本的物镜系统的物镜平面上的不同位置的第一和第二区域。 第一和第二电子束通过图像形成透镜系统的电子双棱镜重叠在观察平面上。 观察或记录重叠区域。 照射透镜系统的光学作用控制具有样本的物镜上的第一和第二电子束的每个电流密度，以及在具有该样本的物镜系统的第一电子双棱镜和物镜平面之间的电子光学上的距离。